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2SK2110 PDF预览

2SK2110

更新时间: 2024-11-17 22:52:51
品牌 Logo 应用领域
日电电子 - NEC 晶体开关小信号场效应晶体管
页数 文件大小 规格书
6页 61K
描述
N-CHANNEL MOS FET FOR HIGH-SPEED SWITCHING

2SK2110 技术参数

是否Rohs认证: 不符合生命周期:Obsolete
包装说明:SC-62, POWER MINIMOLD, 3 PINReach Compliance Code:compliant
风险等级:5.81Is Samacsys:N
外壳连接:DRAIN配置:SINGLE WITH BUILT-IN DIODE
JESD-30 代码:R-PSSO-F3JESD-609代码:e0
元件数量:1端子数量:3
封装主体材料:PLASTIC/EPOXY封装形状:RECTANGULAR
封装形式:SMALL OUTLINE峰值回流温度(摄氏度):NOT SPECIFIED
认证状态:Not Qualified表面贴装:YES
端子面层:TIN LEAD端子形式:FLAT
端子位置:SINGLE处于峰值回流温度下的最长时间:NOT SPECIFIED
晶体管应用:SWITCHING晶体管元件材料:SILICON
Base Number Matches:1

2SK2110 数据手册

 浏览型号2SK2110的Datasheet PDF文件第2页浏览型号2SK2110的Datasheet PDF文件第3页浏览型号2SK2110的Datasheet PDF文件第4页浏览型号2SK2110的Datasheet PDF文件第5页浏览型号2SK2110的Datasheet PDF文件第6页 
DATA SHEET  
MOS FIELD EFFECT TRANSISTOR  
2SK2110  
N-CHANNEL MOS FET  
FOR HIGH-SPEED SWITCHING  
The 2SK2110 is a N-channel MOS FET of a vertical type and  
PACKAGE DIMENSIONS (in mm)  
is a switching element that can be directly driven by the output of  
an IC operating at 5 V.  
4.5 ± 0.1  
1.5 ± 0.1  
1.6 ± 0.2  
This product has a low ON resistance and superb switching  
characteristics and is ideal for driving the actuators, such as  
motors and DC/DC converters.  
D
S
G
0.42  
±0.06  
0.42  
±0.06  
0.47  
1.5  
FEATURES  
±0.06  
+0.03  
0.41  
–0.05  
3.0  
Low ON resistance  
RDS(on) = 1.5 MAX. @VGS = 4.0 V, ID = 0.3 A  
High switching speed  
EQUIVALENT CIRCUIT  
Drain (D)  
ton + toff < 100 ns  
Low parasitic capacitance  
Gate (G)  
Internal diode  
PIN CONNECTIONS  
Gate  
protection  
diode  
S: Source  
D: Drain  
G: Gate  
Source (S)  
Marking: NT  
ABSOLUTE MAXIMUM RATINGS (TA = 25 ˚C)  
PARAMETER  
Drain to Source Voltage  
Gate to Source Voltage  
Drain Current (DC)  
SYMBOL  
VDSS  
TEST CONDITIONS  
RATING  
UNIT  
VGS = 0  
VDS = 0  
100  
±20  
V
V
A
A
VGSS  
ID(DC)  
±0.5  
±1.0  
Drain Current (Pulse)  
ID(pulse)  
PW 10 ms,  
Duty cycle 50 %  
Total Power Dissipation  
Channel Temperature  
Storage Temperature  
PT  
16 cm2 × 0.7 mm, ceramic substrate used  
2.0  
150  
W
˚C  
˚C  
Tch  
Tstg  
–55 to +150  
Document No. D11230EJ2V0DS00 (2nd edition)  
Date Published June 1996 P  
Printed in Japan  
1996  

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