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HLX6256-QN PDF预览

HLX6256-QN

更新时间: 2024-11-01 03:42:07
品牌 Logo 应用领域
霍尼韦尔 - HONEYWELL /
页数 文件大小 规格书
12页 153K
描述
32K x 8 STATIC RAM Low Power SOI

HLX6256-QN 数据手册

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Military & Space Products  
32K x 8 STATIC RAM—Low Power SOI  
HLX6256  
FEATURES  
RADIATION  
OTHER  
• Fabricated with RICMOSIV Silicon on Insulator (SOI)  
0.55 µm Low Power Process  
• Read/Write Cycle Times  
17 ns (Typical)  
25 ns (-55 to 125°C)  
• Total Dose Hardness through 1x106 rad(SiO2)  
• Neutron Hardness through 1x1014 cm-2  
• Typical Operating Power <10 mW/MHz  
• Asynchronous Operation  
• Dynamic and Static Transient Upset Hardness  
through 1x109 rad(Si)/s  
• JEDEC Standard Low Voltage  
CMOS Compatible I/O  
• Dose Rate Survivability through 1x1011 rad(Si)/s  
• Soft Error Rate of <1x10-10 upsets/bit-day  
• Latchup Free  
• Single 3.3 V 0.3V Power Supply  
• Packaging Options  
- 28-Lead Flat Pack (0.500 in. x 0.720 in.)  
- 28-Lead DIP, MIL-STD-1835, CDIP2-T28  
- 36-Lead Flat Pack (0.630 in. x 0.650 in.)  
- Various Multi-Chip Module (MCM) Configurations  
GENERAL DESCRIPTION  
The 32K x 8 Radiation Hardened Static RAM is a high  
performance 32,768 word x 8-bit static random access  
memory with industry-standard functionality. It is fabri-  
cated with Honeywell’s radiation hardened technology,  
and is designed for use in low voltage systems operating in  
radiation environments. The RAM operates over the full  
military temperature range and requires only a single 3.3 V  
0.3V power supply. The RAM is compatible with JEDEC  
standard low voltage CMOS I/O. Power consumption is  
typically less than 10 mW/MHz in operation, and less than  
2 mW when de-selected. The RAM read operation is fully  
asynchronous,withanassociatedtypicalaccesstimeof14  
ns at 3.3 V.  
Honeywell’senhancedSOIRICMOSIV(RadiationInsen-  
sitiveCMOS)technologyisradiationhardenedthroughthe  
use of advanced and proprietary design, layout and pro-  
cess hardening techniques. The RICMOSIV low power  
process is a SIMOX CMOS technology with a 150 Å gate  
oxideandaminimumdrawnfeaturesizeof0.7µm(0.55µm  
effective gate length—Leff). Additional features include  
tungsten via plugs, Honeywell’s proprietary SHARP pla-  
narization process and a lightly doped drain (LDD) struc-  
ture for improved short channel reliability. A 7 transistor  
(7T) memory cell is used for superior single event upset  
hardening, while three layer metal power bussing and the  
low collection volume SIMOX substrate provide improved  
dose rate hardening.  

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