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CS200A PDF预览

CS200A

更新时间: 2024-11-29 03:26:55
品牌 Logo 应用领域
富士通 - FUJITSU /
页数 文件大小 规格书
2页 604K
描述
65nm CMOS Technology

CS200A 数据手册

 浏览型号CS200A的Datasheet PDF文件第2页 
65nm CMOS Technology, CS200 / CS200A  
Description  
As miniaturization of silicon devices progresses,  
Fujitsu provides the most competitive, world-class  
technology to ASIC and COT customers. Fujitsu's  
65nm technology has shrunk gates by 25% when  
compared to the 90nm technology.  
Fujitsu will start tape-out acceptance for the  
technology in early 2006.  
Features  
The 30nm long gate, only 75% the size of the  
• Transistor density doubled compared with the  
90nm generation.  
CS100 transistors.  
• 20 to 30% faster performance than the 90nm  
generation.  
• SRAM cell area reduced 50% compared with the  
90nm generation.  
Specifications  
65nm (CS200)  
65nm (CS200A)  
Gate length  
30nm  
50nm  
Core VDD  
1.0V  
1.2V  
Gate oxide thickness (physical)  
Gate electrode  
1.1nm  
1.7nm  
NiSi / Poly-Si  
NiSi  
CoSi2 / Poly-Si  
Source / drain electrode  
Interconnects  
CoSi2  
s
11-Cu + 1-Al  
0.18µm  
Metal 1 pitch  
s
Inter-level dielectric  
Drain current enhancement  
Porous ULK (k = 2.25)  
Advanced stress control  
s
s

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