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2NBS08-TF2-121LF PDF预览

2NBS08-TF2-121LF

更新时间: 2024-12-02 07:01:03
品牌 Logo 应用领域
伯恩斯 - BOURNS /
页数 文件大小 规格书
4页 342K
描述
Array/Network Resistor, Bussed, Thin Film, 0.6W, 120ohm, 50V, 1% +/-Tol, 150ppm/Cel, Surface Mount, 1620, SOIC, ROHS COMPLIANT

2NBS08-TF2-121LF 数据手册

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Models 2QSP-XX2 and 2NBS-XX2  
are obsolete and not recommended  
for new designs.  
Features  
Lead free  
RoHS compliant*  
Multiple resistors tied to a common node  
Stable thin-film-on-silicon technology  
Applications  
Bus termination  
Ultra-miniature packages to JEDEC  
standards  
Pull-up/pull-down  
Ideal for space-constrained applications  
Thin Film on Silicon 2QSP / 2NBS-XX2 Bussed Resistors  
General Information  
Package Schematic  
16  
15  
14  
13  
12  
11  
10  
9
Bussed Resistor networks are typically used in DC pull-up  
and pull-down applications where system data or control lines  
must be tied to a fixed potential. Fabricated with a Tantalum  
Nitride and Nickel Chromium on Silicon process, these  
resistors feature excellent stability, TCR and tracking  
performance. Bussed Resistor Networks are available in a  
range of miniature package types conforming to JEDEC  
standards.  
1
2
3
5
6
7
8
Electrical & Environmental Characteristics  
Electrical Characteristics  
Symb
inimu
Nominal  
Maximum  
Unit  
Resistance Range  
R
100  
100 K  
Tolerance:  
Absolute  
Ratio  
±0.ꢀ ꢁ  
±0.1 ꢁ  
±ꢀ ꢁ  
±± ꢁ  
TCR:  
Absolute  
Tracking  
100  
1ꢀ0  
±ꢀ  
ppm/°C  
ppm/°C  
Operating Voltage  
ꢀ0  
V
Environmental Characteristics  
ESD  
± K  
-ꢀꢀ  
-6ꢀ  
V
°C  
Operating Temperature  
T
J
+1±ꢀ  
+1ꢀ0  
0.1  
Storage Temperature  
T
°C  
stg  
Power Rating per Resistor @ 70 °C  
Power Rating per Package @ 70 °C:  
Watt  
QSOP:  
16 Pin  
±0, ±4 Pin  
±8 Pin  
0.7ꢀ  
1.00  
1.1±  
Watt  
Watt  
Watt  
NBSOIC: 8 Pin  
14, 16 Pin  
0.60  
1.00  
Watt  
Watt  
*RoHS Directive 2002/95/EC Jan 27, 2003 including Annex  
Specifications are subject to change without notice.  
Customers should verify actual device performance in their specific applications.  

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