LP 3 0 0 0 P 1 0 0
P ACKAGED 2 W POWER P HEMT
·
·
FEATURES
¨
¨
¨
33 dBm Output Power at 1-dB Compression at 15 GHz
8 dB Power Gain at 15 GHz
60% Power-Added Efficiency
DES CRIP TION AND AP P LICATIONS
The LP3000P100 is a packaged Aluminum Gallium Arsenide / Indium Gallium Arsenide
(AlGaAs/InGaAs) pseudomorphic High Electron Mobility Transistor (pHEMT). It utilizes a
0.25 mm x 3000 mm Schottky barrier gate, defined by electron-beam photolithography. The recessed
“mushroom” gate structure minimizes parasitic gate-source and gate resistance. The epitaxial
structure and processing have been optimized for reliable high-power applications. The LP3000 also
features Si3N4 passivation and is available in die form or in other packages.
The LP3000P100 is designed for medium-power, linear amplification. This device is suitable for
applications in commercial and military environments, and it is appropriate to be used as a medium
power transistor in SATCOM uplink transmitters, medium-haul digital radio transmitters, PCS high
efficiency amplifiers, and WLL systems.
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ELECTRICAL S P ECIFICATIONS @ TAm b ie n t = 2 5 °C
Parameter
Symbol
IDSS
Test Conditions
Min
800
31.5
7
Typ
975
33
Max
Units
mA
dBm
dB
Saturated Drain-Source Current
Power at 1-dB Compression
Power Gain at 1-dB Compression
Power-Added Efficiency
VDS = 2 V; VGS = 0 V
1100
P-1dB
G-1dB
PAE
VDS = 8 V; IDS = 50% IDSS
VDS = 8 V; IDS = 50% IDSS
8
45
%
VDS = 8 V; IDS = 50% IDSS
PIN = 17 dBm
;
Maximum Drain-Source Current
Transconductance
IMAX
GM
VDS = 2 V; VGS = 1 V
VDS = 2 V; VGS = 0 V
VGS = -5 V
1700
900
15
mA
mS
mA
V
700
Gate-Source Leakage Current
Pinch-Off Voltage
IGSO
VP
130
-2.0
VDS = 2 V; IDS = 5 mA
IGS = 8 mA
-0.25
-12
-1.2
-15
Gate-Source Breakdown
Voltage Magnitude
|VBDGS
|
V
Gate-Drain Breakdown
Voltage Magnitude
|VBDGD
|
IGD = 8 mA
-12
-16
V
frequency=15 GHz
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Re vis e d : 1/20/01
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