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HRT0100AWN PDF预览

HRT0100AWN

更新时间: 2024-01-04 07:19:08
品牌 Logo 应用领域
霍尼韦尔 - HONEYWELL 静态存储器内存集成电路
页数 文件大小 规格书
12页 1364K
描述
Standard SRAM

HRT0100AWN 技术参数

生命周期:Active包装说明:,
Reach Compliance Code:unknown风险等级:5.77
Is Samacsys:N内存集成电路类型:STANDARD SRAM
Base Number Matches:1

HRT0100AWN 数据手册

 浏览型号HRT0100AWN的Datasheet PDF文件第2页浏览型号HRT0100AWN的Datasheet PDF文件第3页浏览型号HRT0100AWN的Datasheet PDF文件第4页浏览型号HRT0100AWN的Datasheet PDF文件第5页浏览型号HRT0100AWN的Datasheet PDF文件第6页浏览型号HRT0100AWN的Datasheet PDF文件第7页 
HRT6408  
HRT6408 512k x 8 Static RAM  
Radiation Tolerant  
Features  
Fabricated on S150 Silicon On  
Insulator (SOI) CMOS  
150 nm Process (Leff = 110 nm)  
Read/Write Cycle Times  
Typical Write = 7 ns  
Typical Read = 12ns  
Asynchronous Operation  
CMOS Compatible I/O  
5
Total Dose 3X10 rad(Si)  
Soft Error Rate  
-12  
Heavy Ion 1x10  
-12  
Proton 2x10  
Upsets/bit-day  
Upsets/bit-day  
14  
2
Neutron 1x10 N/cm  
No Latchup  
Core Operating Voltage  
1.8 V ± 0.15 V  
I/O Voltages  
3.3 V ± 0.3 V  
2.5 V ± 0.2 V  
Operating Range is  
-55°C to +125°C  
36-Lead Flat Pack Package  
The monolithic 512k x 8 Radiation Tolerant Static RAM is a high performance  
524,288 word x 8-bit static random access memory, fabricated with Honeywell’s  
150nm silicon-on-insulator CMOS (S150) technology.  
It is designed for use in low voltage  
systems operating in radiation sensitive  
environments. The RAM operates over  
the full military temperature range and  
can operate on power supplies of 1.8V,  
2.5V or 3.3V. The SRAM supports I/O  
voltages of 3.3V and 2.5V.  
process hardening techniques. There  
is no internal EDAC implemented.  
It is a low power process with a minimum  
drawn feature size of 150 nm. This  
delivers high speed with typical READ  
access time of 12ns, WRITE time of 7ns  
and a low power consumption of 35  
mW at 40 MHz. A seven transistor (7T)  
memory cell is used for superior single  
event upset hardening.  
Honeywell’s S150 technology is radiation  
hardened through the use of advanced  
and proprietary design, layout and  

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