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MAAMGM0003-DIE PDF预览

MAAMGM0003-DIE

更新时间: 2024-01-16 23:17:07
品牌 Logo 应用领域
泰科 - TE 放大器射频微波
页数 文件大小 规格书
7页 269K
描述
0.4W Variable Distributed Amplifier 1.0 - 15.0 GHz

MAAMGM0003-DIE 技术参数

生命周期:ObsoleteReach Compliance Code:unknown
风险等级:5.84Is Samacsys:N
特性阻抗:50 Ω构造:COMPONENT
增益:7.5 dB最大输入功率 (CW):25 dBm
最大工作频率:15000 MHz最小工作频率:1000 MHz
射频/微波设备类型:WIDE BAND MEDIUM POWER最大电压驻波比:2
Base Number Matches:1

MAAMGM0003-DIE 数据手册

 浏览型号MAAMGM0003-DIE的Datasheet PDF文件第2页浏览型号MAAMGM0003-DIE的Datasheet PDF文件第3页浏览型号MAAMGM0003-DIE的Datasheet PDF文件第4页浏览型号MAAMGM0003-DIE的Datasheet PDF文件第5页浏览型号MAAMGM0003-DIE的Datasheet PDF文件第6页浏览型号MAAMGM0003-DIE的Datasheet PDF文件第7页 
RO-P-DS-3046 - -  
0.4W Variable Distributed Amplifier  
1.0 – 15.0 GHz  
Preliminary Information  
Features  
1.0 - 15.0 GHz GaAs MMIC Amplifier  
1.0 to 15.0 GHz Operation  
0.4 Watt Saturated Output Power Level  
Variable Gain Control  
Select at Test Biasing  
Variable Drain Voltage (5-8V) Operation  
Self-Aligned MSAG® MESFET Process  
Primary Applications  
EW  
Radar  
Description  
The MAAMGM0003-Die is a 0.4W Distributed Amplifier  
with on-chip bias networks and variable gain control. This  
product is fully matched to 50 ohms on both the input and  
output. The MMIC can be used as a broadband amplifier  
stage or as a driver stage in high power applications.  
Each device is 100% RF tested on wafer to ensure  
performance compliance. The part is fabricated using M/  
A-COM’s repeatable, high performance and highly reli-  
able GaAs Multifunction Self-Aligned Gate (MSAG®)  
MESFET Process. This process features silicon oxyni-  
Electrical Characteristics: TB = 40°C1, Z0 = 50, VDD = 7V, VGG = -2V, Pin = 20 dBm  
Parameter  
Symbol  
Typical  
Units  
Bandwidth  
1.0-15.0  
GHz  
f
Output Power  
26  
11  
25  
7.5  
dBm  
%
POUT  
PAE  
Power Added Efficiency  
1-dB Compression Point  
Small Signal Gain  
dBm  
dB  
P1dB  
G
OTOI  
VSWR  
Output TOI  
39  
dBm  
Input VSWR  
2:1  
Gate Current  
Drain Current  
< 8  
mA  
mA  
IGG  
IDD  
< 480  
1. TB = MMIC Base Temperature  

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